Characteristics of titanium oxide films deposited by an activated reactive evaporation method

Tatsuo Fujii, Naoki Sakata, Jun Takada, Yoshinari Miura, Yoshihiro Daitoh, Mikio Takano

Research output: Contribution to journalArticle

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Abstract

Titanium di- and sesquioxide films were epitaxially grown on the (001) surface of sapphire single-crystalline substrates by an activated reactive evaporation method. Formation range for each titanium oxide was determined as a function of oxygen pressure (PO(2)) by means of x-ray diffraction, transmission electron microscopy, and Raman spectroscopy. Films prepared at PO(2)≥2.0×10-4 Torr were stoichiometric (100)-oriented rutile of TiO2, and with decreasing PO(2) they would accommodate more and more Ti3+ ions in the rutile structure. At PO(2) = 0.6×10-4 Torr, on the other hand, (001)-oriented Ti2O3 was formed and an electrical transition was clearly detected at about 400 K. However, the large lattice mismatch between the substrate and these films leads to a periodic introduction of misfit dislocations in the case of the TiO2 films and a mixing of stacking sequences for the Ti2O3 films.

Original languageEnglish
Pages (from-to)1468-1473
Number of pages6
JournalJournal of Materials Research
Volume9
Issue number6
Publication statusPublished - Jun 1994

Fingerprint

Titanium oxides
titanium oxides
Oxide films
oxide films
Evaporation
evaporation
rutile
Lattice mismatch
Aluminum Oxide
Substrates
Dislocations (crystals)
Sapphire
Titanium dioxide
Raman spectroscopy
sapphire
x ray diffraction
Diffraction
titanium dioxide
Ions
Oxygen

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Fujii, T., Sakata, N., Takada, J., Miura, Y., Daitoh, Y., & Takano, M. (1994). Characteristics of titanium oxide films deposited by an activated reactive evaporation method. Journal of Materials Research, 9(6), 1468-1473.

Characteristics of titanium oxide films deposited by an activated reactive evaporation method. / Fujii, Tatsuo; Sakata, Naoki; Takada, Jun; Miura, Yoshinari; Daitoh, Yoshihiro; Takano, Mikio.

In: Journal of Materials Research, Vol. 9, No. 6, 06.1994, p. 1468-1473.

Research output: Contribution to journalArticle

Fujii, T, Sakata, N, Takada, J, Miura, Y, Daitoh, Y & Takano, M 1994, 'Characteristics of titanium oxide films deposited by an activated reactive evaporation method', Journal of Materials Research, vol. 9, no. 6, pp. 1468-1473.
Fujii, Tatsuo ; Sakata, Naoki ; Takada, Jun ; Miura, Yoshinari ; Daitoh, Yoshihiro ; Takano, Mikio. / Characteristics of titanium oxide films deposited by an activated reactive evaporation method. In: Journal of Materials Research. 1994 ; Vol. 9, No. 6. pp. 1468-1473.
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