Changes in atomic and electronic structures of amorphous WO3 films due to electrochemical ion insertion

Tokuro Nanba, M. Ishikawa, Y. Sakai, Y. Miura

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The structural changes in amorphous WO3 films were investigated both on the atomic and electronic levels, and the experimental findings were interpreted using molecular orbital calculations. Electrochemical fast intercalation resulted in the splitting of a peak in the valence band region of the X-ray photoelectron spectrum. This splitting could be attributed to the formation of non-bridging oxygen. Decomposition of WO6 units into WO4 units could also be inferred from the data. This decomposition was, however, not responsible for the split of the photoelectron peak. From the population analyses it was found that the average bond strength decreased due to the intercalation, while select W-O bonds increased in strength. It was expected that these changes in the chemical bonding character lead to localization of electrons and distortion of WO6 units, which was consistent with the theoretical interpretations of electrochromism, the intervalence charge transfer model and the small polaron absorption theory.

Original languageEnglish
Pages (from-to)175-181
Number of pages7
JournalThin Solid Films
Volume445
Issue number2
DOIs
Publication statusPublished - Dec 15 2003

Fingerprint

Crystal atomic structure
Amorphous films
Intercalation
Photoelectrons
atomic structure
intercalation
Electronic structure
insertion
photoelectrons
Electrochromism
Ions
electrochromism
electronic structure
Decomposition
decomposition
Gene Conversion
Orbital calculations
electronic levels
Molecular orbitals
Valence bands

Keywords

  • Molecular orbital calculation
  • Structure
  • Tungsten trioxide
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Changes in atomic and electronic structures of amorphous WO3 films due to electrochemical ion insertion. / Nanba, Tokuro; Ishikawa, M.; Sakai, Y.; Miura, Y.

In: Thin Solid Films, Vol. 445, No. 2, 15.12.2003, p. 175-181.

Research output: Contribution to journalArticle

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