Bulk and surface physical properties of a CrO2 thin film prepared from a Cr8 O21 precursor

K. Iwai, Y. Muraoka, T. Wakita, M. Hirai, T. Yokoya, Y. Kato, T. Muro, Y. Tamenori

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8 Citations (Scopus)

Abstract

We have prepared a CrO2 thin film by chemical vapor deposition from a Cr8 O21 precursor and studied the bulk and surface physical properties. The CrO2 thin film is grown on a TiO2 (100) substrate by heating of a Cr8 O21 precursor and TiO2 (100) substrate together in a sealed quartz tube. The prepared film is found from x-ray diffraction analysis to be an (100)-oriented single phase. The magnetization and resistivity measurements indicate that the film is a ferromagnetic metal with a Curie temperature of about 400 K. Cr 3s core-level and valence band photoelectron spectroscopy spectra reveal the presence of a metallic CrO2 in the surface region of the film. Our work indicates that preparation from a Cr8 O21 precursor is promising for obtaining a CrO2 thin film with the metallic surface.

Original languageEnglish
Article number043916
JournalJournal of Applied Physics
Volume108
Issue number4
DOIs
Publication statusPublished - Aug 15 2010

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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