Boron-incorporated amorphous carbon films deposited by pulsed laser deposition

Xuemin Tian, Mohamad Rusop, Yasuhiko Hayashi, Tetsuo Soga, Takashi Jimbo, Masayoshi Umeno

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Boron-incorporated carbon films (a-C(B)) were deposited on a silicon substrate by pulsed laser deposition (PLD) of a graphite target at room temperature. The boron content was determined by X-ray photoelectron spectroscopy (XPS) to be in the range of 0.2-1.7 at.% in the films. These films were confirmed to be p-type due to the formation of a heterojunction between the a-C(B) carbon film and silicon substrate. The devices of C(B)/n-Si configuration show a maximum [open-circuit voltage] Voc = 0.25 V, and [short-circuit current density] Jsc = 2.1 mA/cm2 under illumination (AM 1.5, 100 mW/cm2).

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume41
Issue number9 A/B
Publication statusPublished - Sep 15 2002
Externally publishedYes

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Pulsed laser deposition
pulsed laser deposition
Boron
boron
Silicon
carbon
Open circuit voltage
Substrates
Short circuit currents
Heterojunctions
Graphite
Current density
X ray photoelectron spectroscopy
Lighting
silicon
short circuit currents
open circuit voltage

Keywords

  • Amorphous
  • Boron-incorporated
  • Heterojunction
  • Photovoltaic

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Boron-incorporated amorphous carbon films deposited by pulsed laser deposition. / Tian, Xuemin; Rusop, Mohamad; Hayashi, Yasuhiko; Soga, Tetsuo; Jimbo, Takashi; Umeno, Masayoshi.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 41, No. 9 A/B, 15.09.2002.

Research output: Contribution to journalArticle

Tian, Xuemin ; Rusop, Mohamad ; Hayashi, Yasuhiko ; Soga, Tetsuo ; Jimbo, Takashi ; Umeno, Masayoshi. / Boron-incorporated amorphous carbon films deposited by pulsed laser deposition. In: Japanese Journal of Applied Physics, Part 2: Letters. 2002 ; Vol. 41, No. 9 A/B.
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