TY - GEN
T1 - Automated design of infrared digital metamaterials by genetic algorithm
AU - Sugino, Yuya
AU - Ishikawa, Atsushi
AU - Hayashi, Yasuhiko
AU - Tsuruta, Kenji
N1 - Funding Information:
This work was supported in part by the JSPS KAKENHI Grant Number 15KK0237. The nanofabrication in this work was performed at the Division of Instrumental Analysis, Okayama University.
Publisher Copyright:
© 2017 SPIE.
PY - 2017
Y1 - 2017
N2 - We demonstrate automatic design of infrared (IR) metamaterials using a genetic algorithm (GA) and experimentally characterize their IR properties. To implement the automated design scheme of the metamaterial structures, we adopt a digital metamaterial consisting of 7 × 7 Au nano-pixels with an area of 200 nm × 200 nm, and their placements are coded as binary genes in the GA optimization process. The GA combined with three-dimensional (3D) finite element method (FEM) simulation is developed and applied to automatically construct a digital metamaterial to exhibit pronounced plasmonic resonances at the target IR frequencies. Based on the numerical results, the metamaterials are fabricated on a Si substrate over an area of 1 mm × 1 mm by using an EB lithography, Cr/Au (2/20 nm) depositions, and liftoff process. In the FT-IR measurement, pronounced plasmonic responses of each metamaterial are clearly observed near the targeted frequencies, although the synthesized pixel arrangements of the metamaterials are seemingly random. The corresponding numerical simulations reveal the important resonant behavior of each pixel and their hybridized systems. Our approach is fully computer-aided without artificial manipulation, thus paving the way toward the novel device design for next-generation plasmonic device applications.
AB - We demonstrate automatic design of infrared (IR) metamaterials using a genetic algorithm (GA) and experimentally characterize their IR properties. To implement the automated design scheme of the metamaterial structures, we adopt a digital metamaterial consisting of 7 × 7 Au nano-pixels with an area of 200 nm × 200 nm, and their placements are coded as binary genes in the GA optimization process. The GA combined with three-dimensional (3D) finite element method (FEM) simulation is developed and applied to automatically construct a digital metamaterial to exhibit pronounced plasmonic resonances at the target IR frequencies. Based on the numerical results, the metamaterials are fabricated on a Si substrate over an area of 1 mm × 1 mm by using an EB lithography, Cr/Au (2/20 nm) depositions, and liftoff process. In the FT-IR measurement, pronounced plasmonic responses of each metamaterial are clearly observed near the targeted frequencies, although the synthesized pixel arrangements of the metamaterials are seemingly random. The corresponding numerical simulations reveal the important resonant behavior of each pixel and their hybridized systems. Our approach is fully computer-aided without artificial manipulation, thus paving the way toward the novel device design for next-generation plasmonic device applications.
KW - Computer-Aided Design
KW - Genetic Algorithm
KW - Infrared Properties
KW - Metamaterials
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U2 - 10.1117/12.2273607
DO - 10.1117/12.2273607
M3 - Conference contribution
AN - SCOPUS:85033572070
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Metamaterials, Metadevices, and Metasystems 2017
A2 - Zheludev, Nikolay I.
A2 - Noginov, Mikhail A.
A2 - Engheta, Nader
A2 - Zheludev, Nikolay I.
PB - SPIE
T2 - Metamaterials, Metadevices, and Metasystems 2017
Y2 - 6 August 2017 through 10 August 2017
ER -