Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

Original languageEnglish
Title of host publicationAlternative Lithographic Technologies
DOIs
Publication statusPublished - Jun 19 2009
EventAlternative Lithographic Technologies - San Jose, CA, United States
Duration: Feb 24 2009Feb 26 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7271
ISSN (Print)0277-786X

Other

OtherAlternative Lithographic Technologies
CountryUnited States
CitySan Jose, CA
Period2/24/092/26/09

Keywords

  • Atomic process
  • Atomic spectroscopy
  • EUV source
  • Multiple charged ion
  • Radiation hydrodynamics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Atomic processes in the LPP and LA-DPP EUV sources'. Together they form a unique fingerprint.

  • Cite this

    Sasaki, A., Nishihara, K., Sunahara, A., Furukawa, H., Nishikawa, T., & Koike, F. (2009). Atomic processes in the LPP and LA-DPP EUV sources. In Alternative Lithographic Technologies [727130] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7271). https://doi.org/10.1117/12.814026