Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki; Katsunobu Nishihara; Atsushi Sunahara; Hiroyuki Furukawa; Takeshi Nishikawa; Fumihiro Koike

doi:10.1117/12.814026

Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

Original language	English
Title of host publication	Alternative Lithographic Technologies
DOIs	https://doi.org/10.1117/12.814026
Publication status	Published - 2009
Event	Alternative Lithographic Technologies - San Jose, CA, United States Duration: Feb 24 2009 → Feb 26 2009

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7271
ISSN (Print)	0277-786X

Other

Other	Alternative Lithographic Technologies
Country/Territory	United States
City	San Jose, CA
Period	2/24/09 → 2/26/09

Keywords

Atomic process
Atomic spectroscopy
EUV source
Multiple charged ion
Radiation hydrodynamics

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.814026

Cite this

Sasaki, A, Nishihara, K, Sunahara, A, Furukawa, H, Nishikawa, T & Koike, F 2009, Atomic processes in the LPP and LA-DPP EUV sources. in Alternative Lithographic Technologies., 727130, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7271, Alternative Lithographic Technologies, San Jose, CA, United States, 2/24/09. https://doi.org/10.1117/12.814026

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title = "Atomic processes in the LPP and LA-DPP EUV sources",

abstract = "We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.",

keywords = "Atomic process, Atomic spectroscopy, EUV source, Multiple charged ion, Radiation hydrodynamics",

author = "Akira Sasaki and Katsunobu Nishihara and Atsushi Sunahara and Hiroyuki Furukawa and Takeshi Nishikawa and Fumihiro Koike",

year = "2009",

doi = "10.1117/12.814026",

language = "English",

isbn = "9780819475244",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Alternative Lithographic Technologies",

note = "Alternative Lithographic Technologies ; Conference date: 24-02-2009 Through 26-02-2009",

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T1 - Atomic processes in the LPP and LA-DPP EUV sources

AU - Sasaki, Akira

AU - Nishihara, Katsunobu

AU - Sunahara, Atsushi

AU - Furukawa, Hiroyuki

AU - Nishikawa, Takeshi

AU - Koike, Fumihiro

PY - 2009

Y1 - 2009

N2 - We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

AB - We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

KW - Atomic process

KW - Atomic spectroscopy

KW - EUV source

KW - Multiple charged ion

KW - Radiation hydrodynamics

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DO - 10.1117/12.814026

M3 - Conference contribution

AN - SCOPUS:67149130591

SN - 9780819475244

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Alternative Lithographic Technologies

T2 - Alternative Lithographic Technologies

Y2 - 24 February 2009 through 26 February 2009

ER -

Atomic processes in the LPP and LA-DPP EUV sources

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Keywords

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