Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume7271
DOIs
Publication statusPublished - 2009
EventAlternative Lithographic Technologies - San Jose, CA, United States
Duration: Feb 24 2009Feb 26 2009

Other

OtherAlternative Lithographic Technologies
CountryUnited States
CitySan Jose, CA
Period2/24/092/26/09

Fingerprint

EUV Source
Tin
tin
Plasma
Ions
Plasmas
Plasma density
Radiative transfer
plasma temperature
Opacity
opacity
emissivity
radiative transfer
plasma density
Conversion efficiency
Emissivity
ions
pumping
Radiative Transfer
Radiation

Keywords

  • Atomic process
  • Atomic spectroscopy
  • EUV source
  • Multiple charged ion
  • Radiation hydrodynamics

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Sasaki, A., Nishihara, K., Sunahara, A., Furukawa, H., Nishikawa, T., & Koike, F. (2009). Atomic processes in the LPP and LA-DPP EUV sources. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 7271). [727130] https://doi.org/10.1117/12.814026

Atomic processes in the LPP and LA-DPP EUV sources. / Sasaki, Akira; Nishihara, Katsunobu; Sunahara, Atsushi; Furukawa, Hiroyuki; Nishikawa, Takeshi; Koike, Fumihiro.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7271 2009. 727130.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sasaki, A, Nishihara, K, Sunahara, A, Furukawa, H, Nishikawa, T & Koike, F 2009, Atomic processes in the LPP and LA-DPP EUV sources. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 7271, 727130, Alternative Lithographic Technologies, San Jose, CA, United States, 2/24/09. https://doi.org/10.1117/12.814026
Sasaki A, Nishihara K, Sunahara A, Furukawa H, Nishikawa T, Koike F. Atomic processes in the LPP and LA-DPP EUV sources. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7271. 2009. 727130 https://doi.org/10.1117/12.814026
Sasaki, Akira ; Nishihara, Katsunobu ; Sunahara, Atsushi ; Furukawa, Hiroyuki ; Nishikawa, Takeshi ; Koike, Fumihiro. / Atomic processes in the LPP and LA-DPP EUV sources. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7271 2009.
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