Atomic modeling of the plasma EUV sources

Akira Sasaki; Atsushi Sunahara; Hiroyuki Furukawa; Katsunobu Nishihara; Takeshi Nishikawa; Fumihiro Koike; Hajime Tanuma

doi:10.1016/j.hedp.2009.04.002

Atomic modeling of the plasma EUV sources

Akira Sasaki, Atsushi Sunahara, Hiroyuki Furukawa, Katsunobu Nishihara, Takeshi Nishikawa, Fumihiro Koike, Hajime Tanuma

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.

Original language	English
Pages (from-to)	147-151
Number of pages	5
Journal	High Energy Density Physics
Volume	5
Issue number	3
DOIs	https://doi.org/10.1016/j.hedp.2009.04.002
Publication status	Published - Sep 2009

Keywords

Collisional-radiative model
EUV lithography
Laser produced plasma
Opacity
Plasma spectroscopy

ASJC Scopus subject areas

Radiation
Nuclear and High Energy Physics

Access to Document

10.1016/j.hedp.2009.04.002

Fingerprint Dive into the research topics of 'Atomic modeling of the plasma EUV sources'. Together they form a unique fingerprint.

Cite this

Sasaki, A., Sunahara, A., Furukawa, H., Nishihara, K., Nishikawa, T., Koike, F., & Tanuma, H. (2009). Atomic modeling of the plasma EUV sources. High Energy Density Physics, 5(3), 147-151. https://doi.org/10.1016/j.hedp.2009.04.002

@article{48f4399de983430e9d4c4f74ecd556e3,

title = "Atomic modeling of the plasma EUV sources",

abstract = "We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.",

keywords = "Collisional-radiative model, EUV lithography, Laser produced plasma, Opacity, Plasma spectroscopy",

author = "Akira Sasaki and Atsushi Sunahara and Hiroyuki Furukawa and Katsunobu Nishihara and Takeshi Nishikawa and Fumihiro Koike and Hajime Tanuma",

year = "2009",

month = sep,

doi = "10.1016/j.hedp.2009.04.002",

language = "English",

volume = "5",

pages = "147--151",

journal = "High Energy Density Physics",

issn = "1574-1818",

publisher = "Elsevier",

number = "3",

}

TY - JOUR

T1 - Atomic modeling of the plasma EUV sources

AU - Sasaki, Akira

AU - Sunahara, Atsushi

AU - Furukawa, Hiroyuki

AU - Nishihara, Katsunobu

AU - Nishikawa, Takeshi

AU - Koike, Fumihiro

AU - Tanuma, Hajime

PY - 2009/9

Y1 - 2009/9

N2 - We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.

AB - We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.

KW - Collisional-radiative model

KW - EUV lithography

KW - Laser produced plasma

KW - Opacity

KW - Plasma spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=67650321544&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=67650321544&partnerID=8YFLogxK

U2 - 10.1016/j.hedp.2009.04.002

DO - 10.1016/j.hedp.2009.04.002

M3 - Article

AN - SCOPUS:67650321544

VL - 5

SP - 147

EP - 151

JO - High Energy Density Physics

JF - High Energy Density Physics

SN - 1574-1818

IS - 3

ER -