Atomic modeling of the plasma EUV sources

Akira Sasaki; Atsushi Sunahara; Hiroyuki Furukawa; Katsunobu Nishihara; Takeshi Nishikawa; Fumihiro Koike; Hajime Tanuma

doi:10.1016/j.hedp.2009.04.002

Atomic modeling of the plasma EUV sources

Akira Sasaki, Atsushi Sunahara, Hiroyuki Furukawa, Katsunobu Nishihara, Takeshi Nishikawa, Fumihiro Koike, Hajime Tanuma

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9 Citations (Scopus)

Abstract

We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.

Original language	English
Pages (from-to)	147-151
Number of pages	5
Journal	High Energy Density Physics
Volume	5
Issue number	3
DOIs	https://doi.org/10.1016/j.hedp.2009.04.002
Publication status	Published - Sep 1 2009

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Keywords

Collisional-radiative model
EUV lithography
Laser produced plasma
Opacity
Plasma spectroscopy

ASJC Scopus subject areas

Radiation
Nuclear and High Energy Physics

Cite this

Sasaki, A., Sunahara, A., Furukawa, H., Nishihara, K., Nishikawa, T., Koike, F., & Tanuma, H. (2009). Atomic modeling of the plasma EUV sources. High Energy Density Physics, 5(3), 147-151. https://doi.org/10.1016/j.hedp.2009.04.002

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AU - Nishihara, Katsunobu

AU - Nishikawa, Takeshi

AU - Koike, Fumihiro

AU - Tanuma, Hajime

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KW - Laser produced plasma

KW - Opacity

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10.1016/j.hedp.2009.04.002