Atomic modeling of the plasma EUV sources

Akira Sasaki, Atsushi Sunahara, Hiroyuki Furukawa, Katsunobu Nishihara, Takeshi Nishikawa, Fumihiro Koike, Hajime Tanuma

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm.

Original languageEnglish
Pages (from-to)147-151
Number of pages5
JournalHigh Energy Density Physics
Issue number3
Publication statusPublished - Sep 2009


  • Collisional-radiative model
  • EUV lithography
  • Laser produced plasma
  • Opacity
  • Plasma spectroscopy

ASJC Scopus subject areas

  • Radiation
  • Nuclear and High Energy Physics


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