Annealing effects on the hardening of electroless plated Ni-P layer by boron implantation

K. Hanamoto, M. Sasaki, T. Miyashita, Y. Kido, Y. Nakayama, Y. Kawamoto, M. Fujiwara, R. Kaigawa

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1 × 1017 ions/cm2. Increases of Vickers hardness in the near-surface region were observed to an extent of 17% for the pre-annealed specimens compared to unimplanted ones. Post-annealed specimens did not show effective hardening by the implantation treatment. The chemical states of implanted ions were studied by X-ray photoelectron spectroscopy (XPS) and the results may suggest that the increase of hardness is not due to the precipitation of nickel borides, but rather due to amorphization of Ni and Ni3P.

Original languageEnglish
Pages (from-to)391-394
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume145
Issue number3
DOIs
Publication statusPublished - Nov 1998
Externally publishedYes

Keywords

  • Electroless plated Ni-P layer
  • Ion implantation
  • Vickers hardness
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Fingerprint Dive into the research topics of 'Annealing effects on the hardening of electroless plated Ni-P layer by boron implantation'. Together they form a unique fingerprint.

  • Cite this