@inproceedings{15604fbbfbb44e51854e0eefc3ba1c7a,
title = "Analysis of the emission spectrum of Xe and Sn",
abstract = "The atomic processes in the Xe and Sn plasmas are investigated. The wavelength of atomic transitions is shown to have a critical effect in reproducing experiments. The wavelengths of resonance lines in our model are improved through detailed comparison with charge specific spectroscopic measurement. Distribution of satellite lines in the presence of the effect of the configuration interaction (CI) is investigated. The spectral profile of Xe and Sn emission, which determines fraction of usable EUV power, is discussed with respect to its dependence on the plasma temperature, density as well as the optical depth.",
keywords = "Atomic process, EUV lithography, Emissivity, Opacity, Plasma spectroscopy, Simulation",
author = "A. Sasaki and K. Nishihara and A. Sunahara and T. Nishikawa and F. Koike and K. Kagawa and H. Tanuma",
year = "2006",
month = jul,
day = "10",
doi = "10.1117/12.655938",
language = "English",
isbn = "0819461946",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Emerging Lithographic Technologies X",
note = "Emerging Lithographic Technologies X ; Conference date: 21-01-2006 Through 23-01-2006",
}