TY - GEN
T1 - Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions
AU - Nishihara, K.
AU - Sunahara, A.
AU - Sasaki, A.
AU - Fujioka, S.
AU - Shimada, Y.
AU - Nunami, M.
AU - Tanuma, H.
AU - Murakami, M.
AU - Aota, T.
AU - Fujima, K.
AU - Furukawa, H.
AU - Nishikawa, T.
AU - Koike, F.
AU - More, R.
AU - Kato, T.
AU - Zhakhovskii, V.
AU - Gamata, K.
AU - Ueda, H.
AU - Nishimura, H.
AU - Yuba, Y.
AU - Nagai, K.
AU - Miyanaga, N.
AU - Izawa, Y.
AU - Mima, K.
PY - 2008
Y1 - 2008
N2 - We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.
AB - We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.
KW - Conversion efficiency from laser to euv
KW - Debris mitigation
KW - EUVL (Extreme ultraviolet light source for lithography)
KW - Ion mitigation by magnetic field
KW - LPP (Laser-produced plasma)
KW - Radiation hydrodynamic simulation
KW - Tin cleaning
KW - Tin plasma
UR - http://www.scopus.com/inward/record.url?scp=78649267951&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78649267951&partnerID=8YFLogxK
U2 - 10.1117/12.769086
DO - 10.1117/12.769086
M3 - Conference contribution
AN - SCOPUS:78649267951
SN - 9780819471062
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Emerging Lithographic Technologies XII
T2 - Emerging Lithographic Technologies XII
Y2 - 26 February 2008 through 28 February 2008
ER -