Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

K. Nishihara; A. Sunahara; A. Sasaki; S. Fujioka; Y. Shimada; M. Nunami; H. Tanuma; M. Murakami; T. Aota; K. Fujima; H. Furukawa; T. Nishikawa; F. Koike; R. More; T. Kato; V. Zhakhovskii; K. Gamata; H. Ueda; H. Nishimura; Y. Yuba; K. Nagai; N. Miyanaga; Y. Izawa; K. Mima

doi:10.1117/12.769086

Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

K. Nishihara, A. Sunahara, A. Sasaki, S. Fujioka, Y. Shimada, M. Nunami, H. Tanuma, M. Murakami, T. Aota, K. Fujima, H. Furukawa, T. Nishikawa, F. Koike, R. More, T. Kato, V. Zhakhovskii, K. Gamata, H. Ueda, H. Nishimura, Y. YubaK. Nagai, N. Miyanaga, Y. Izawa, K. Mima

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

8 Citations (Scopus)

Abstract

We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.

Original language	English
Title of host publication	Emerging Lithographic Technologies XII
DOIs	https://doi.org/10.1117/12.769086
Publication status	Published - 2008
Event	Emerging Lithographic Technologies XII - San Jose, CA, United States Duration: Feb 26 2008 → Feb 28 2008

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6921
ISSN (Print)	0277-786X

Other

Other	Emerging Lithographic Technologies XII
Country	United States
City	San Jose, CA
Period	2/26/08 → 2/28/08

Keywords

Conversion efficiency from laser to euv
Debris mitigation
EUVL (Extreme ultraviolet light source for lithography)
Ion mitigation by magnetic field
LPP (Laser-produced plasma)
Radiation hydrodynamic simulation
Tin cleaning
Tin plasma

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.769086

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Nishihara, K., Sunahara, A., Sasaki, A., Fujioka, S., Shimada, Y., Nunami, M., Tanuma, H., Murakami, M., Aota, T., Fujima, K., Furukawa, H., Nishikawa, T., Koike, F., More, R., Kato, T., Zhakhovskii, V., Gamata, K., Ueda, H., Nishimura, H., ... Mima, K. (2008). Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions. In Emerging Lithographic Technologies XII [69210Y] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). https://doi.org/10.1117/12.769086

Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions. / Nishihara, K.; Sunahara, A.; Sasaki, A.; Fujioka, S.; Shimada, Y.; Nunami, M.; Tanuma, H.; Murakami, M.; Aota, T.; Fujima, K.; Furukawa, H.; Nishikawa, T.; Koike, F.; More, R.; Kato, T.; Zhakhovskii, V.; Gamata, K.; Ueda, H.; Nishimura, H.; Yuba, Y.; Nagai, K.; Miyanaga, N.; Izawa, Y.; Mima, K.

Emerging Lithographic Technologies XII. 2008. 69210Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nishihara, K, Sunahara, A, Sasaki, A, Fujioka, S, Shimada, Y, Nunami, M, Tanuma, H, Murakami, M, Aota, T, Fujima, K, Furukawa, H, Nishikawa, T, Koike, F, More, R, Kato, T, Zhakhovskii, V, Gamata, K, Ueda, H, Nishimura, H, Yuba, Y, Nagai, K, Miyanaga, N, Izawa, Y & Mima, K 2008, Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions. in Emerging Lithographic Technologies XII., 69210Y, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6921, Emerging Lithographic Technologies XII, San Jose, CA, United States, 2/26/08. https://doi.org/10.1117/12.769086

Nishihara, K. ; Sunahara, A. ; Sasaki, A. ; Fujioka, S. ; Shimada, Y. ; Nunami, M. ; Tanuma, H. ; Murakami, M. ; Aota, T. ; Fujima, K. ; Furukawa, H. ; Nishikawa, T. ; Koike, F. ; More, R. ; Kato, T. ; Zhakhovskii, V. ; Gamata, K. ; Ueda, H. ; Nishimura, H. ; Yuba, Y. ; Nagai, K. ; Miyanaga, N. ; Izawa, Y. ; Mima, K. / Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions. Emerging Lithographic Technologies XII. 2008. (Proceedings of SPIE - The International Society for Optical Engineering).

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title = "Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions",

abstract = "We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.",

keywords = "Conversion efficiency from laser to euv, Debris mitigation, EUVL (Extreme ultraviolet light source for lithography), Ion mitigation by magnetic field, LPP (Laser-produced plasma), Radiation hydrodynamic simulation, Tin cleaning, Tin plasma",

author = "K. Nishihara and A. Sunahara and A. Sasaki and S. Fujioka and Y. Shimada and M. Nunami and H. Tanuma and M. Murakami and T. Aota and K. Fujima and H. Furukawa and T. Nishikawa and F. Koike and R. More and T. Kato and V. Zhakhovskii and K. Gamata and H. Ueda and H. Nishimura and Y. Yuba and K. Nagai and N. Miyanaga and Y. Izawa and K. Mima",

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doi = "10.1117/12.769086",

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T1 - Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

AU - Nishihara, K.

AU - Sunahara, A.

AU - Sasaki, A.

AU - Fujioka, S.

AU - Shimada, Y.

AU - Nunami, M.

AU - Tanuma, H.

AU - Murakami, M.

AU - Aota, T.

AU - Fujima, K.

AU - Furukawa, H.

AU - Nishikawa, T.

AU - Koike, F.

AU - More, R.

AU - Kato, T.

AU - Zhakhovskii, V.

AU - Gamata, K.

AU - Ueda, H.

AU - Nishimura, H.

AU - Yuba, Y.

AU - Nagai, K.

AU - Miyanaga, N.

AU - Izawa, Y.

AU - Mima, K.

PY - 2008

Y1 - 2008

N2 - We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.

AB - We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.

KW - Conversion efficiency from laser to euv

KW - Debris mitigation

KW - EUVL (Extreme ultraviolet light source for lithography)

KW - Ion mitigation by magnetic field

KW - LPP (Laser-produced plasma)

KW - Radiation hydrodynamic simulation

KW - Tin cleaning

KW - Tin plasma

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M3 - Conference contribution

AN - SCOPUS:78649267951

SN - 9780819471062

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Emerging Lithographic Technologies XII

T2 - Emerging Lithographic Technologies XII

Y2 - 26 February 2008 through 28 February 2008

ER -