Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

K. Nishihara, A. Sunahara, A. Sasaki, S. Fujioka, Y. Shimada, M. Nunami, H. Tanuma, M. Murakami, T. Aota, K. Fujima, H. Furukawa, Takeshi Nishikawa, F. Koike, R. More, T. Kato, V. Zhakhovskii, K. Gamata, H. Ueda, H. Nishimura, Y. YubaK. Nagai, N. Miyanaga, Y. Izawa, K. Mima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

We propose a new scheme for high conversion efficiency from laser energy to 13.5 nm extreme ultra violet emission within 2 % band width, a double pulse laser irradiation scheme with a tin droplet target. We consider two-color lasers, a Nd:YAG laser with 1.06 μm in wavelength as a prepulse and a carbon dioxide laser with 10.6 μm in wavelength for a main pulse. We show the possibility of obtaining a CE of 5 - 7 % using a benchmarked radiation hydro code. We have experimentally tested the new scheme and observed increase of CE greater than 4 %. We show many additional advantages of the new scheme, such as reduction of neutral debris, energy reduction of debris ions, and decrease of out of band emission. We also discuss debris problems, such as ion sputtering using newly developed MD simulations, ion mitigation by a newly designed magnetic coil using 3-PIC simulations and tin cleaning experiments.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume6921
DOIs
Publication statusPublished - 2008
EventEmerging Lithographic Technologies XII - San Jose, CA, United States
Duration: Feb 26 2008Feb 28 2008

Other

OtherEmerging Lithographic Technologies XII
CountryUnited States
CitySan Jose, CA
Period2/26/082/28/08

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Keywords

  • Conversion efficiency from laser to euv
  • Debris mitigation
  • EUVL (Extreme ultraviolet light source for lithography)
  • Ion mitigation by magnetic field
  • LPP (Laser-produced plasma)
  • Radiation hydrodynamic simulation
  • Tin cleaning
  • Tin plasma

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Nishihara, K., Sunahara, A., Sasaki, A., Fujioka, S., Shimada, Y., Nunami, M., Tanuma, H., Murakami, M., Aota, T., Fujima, K., Furukawa, H., Nishikawa, T., Koike, F., More, R., Kato, T., Zhakhovskii, V., Gamata, K., Ueda, H., Nishimura, H., ... Mima, K. (2008). Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 6921). [69210Y] https://doi.org/10.1117/12.769086