A new approach to reducing line-edge roughness by using a cross-linked positive-tone resist

Tom Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki, Kenji Kurihara

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

We propose a cross-linking technique as a new approach to reducing the line-edge roughness (LER) of resist patterns. In addition, we also develop a cross-linked positive-tone resist called the suppressed aggregate extraction development (SAGEX) resist, based on this technique. Our key approach to reducing the LER is the suppression of the aggregate extraction development, which causes LER. We demonstrate successful suppression of the aggregate extraction development by cross-linking polymers in the surrounding regions and by reducing the difference between dissolution rates inside and outside the aggregates, and clarify that the LER of the resist patterns in the SAGEX resist is reduced.

Original languageEnglish
Pages (from-to)7114-7118
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number12 B
Publication statusPublished - Dec 1 1999

Keywords

  • Aggregate extraction development
  • Line-edge roughness
  • Polymer aggregates
  • Positive-tone resist

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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