Abstract
We propose a cross-linking technique as a new approach to reducing the line-edge roughness (LER) of resist patterns. In addition, we also develop a cross-linked positive-tone resist called the suppressed aggregate extraction development (SAGEX) resist, based on this technique. Our key approach to reducing the LER is the suppression of the aggregate extraction development, which causes LER. We demonstrate successful suppression of the aggregate extraction development by cross-linking polymers in the surrounding regions and by reducing the difference between dissolution rates inside and outside the aggregates, and clarify that the LER of the resist patterns in the SAGEX resist is reduced.
| Original language | English |
|---|---|
| Pages (from-to) | 7114-7118 |
| Number of pages | 5 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 38 |
| Issue number | 12 B |
| Publication status | Published - Dec 1 1999 |
Keywords
- Aggregate extraction development
- Line-edge roughness
- Polymer aggregates
- Positive-tone resist
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)