5-nm-order electron-beam lithography for nanodevice fabrication

K. Yamazaki; H. Namatsu

doi:10.1109/IMNC.2003.1268626

5-nm-order electron-beam lithography for nanodevice fabrication

K. Yamazaki, H. Namatsu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	162-163
Number of pages	2
ISBN (Print)	4891140402, 9784891140403
DOIs	https://doi.org/10.1109/IMNC.2003.1268626
Publication status	Published - 2003
Externally published	Yes
Event	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: Oct 29 2003 → Oct 31 2003

Other

Other	International Microprocesses and Nanotechnology Conference, MNC 2003
Country	Japan
City	Tokyo
Period	10/29/03 → 10/31/03

Fingerprint

Electron beam lithography

Fabrication

Scanning electron microscopy

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Cite this

Yamazaki, K., & Namatsu, H. (2003). 5-nm-order electron-beam lithography for nanodevice fabrication. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 162-163). [1268626] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268626

5-nm-order electron-beam lithography for nanodevice fabrication. / Yamazaki, K.; Namatsu, H.

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 162-163 1268626.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Yamazaki, K & Namatsu, H 2003, 5-nm-order electron-beam lithography for nanodevice fabrication. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268626, Institute of Electrical and Electronics Engineers Inc., pp. 162-163, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 10/29/03. https://doi.org/10.1109/IMNC.2003.1268626

Yamazaki K, Namatsu H. 5-nm-order electron-beam lithography for nanodevice fabrication. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 162-163. 1268626 https://doi.org/10.1109/IMNC.2003.1268626

Yamazaki, K. ; Namatsu, H. / 5-nm-order electron-beam lithography for nanodevice fabrication. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 162-163

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Access to Document

10.1109/IMNC.2003.1268626