TY - GEN
T1 - 5-nm-order electron-beam lithography for nanodevice fabrication
AU - Yamazaki, K.
AU - Namatsu, H.
PY - 2003/1/1
Y1 - 2003/1/1
N2 - In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
AB - In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
UR - http://www.scopus.com/inward/record.url?scp=84949226574&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84949226574&partnerID=8YFLogxK
U2 - 10.1109/IMNC.2003.1268626
DO - 10.1109/IMNC.2003.1268626
M3 - Conference contribution
AN - SCOPUS:84949226574
T3 - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
SP - 162
EP - 163
BT - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - International Microprocesses and Nanotechnology Conference, MNC 2003
Y2 - 29 October 2003 through 31 October 2003
ER -