Abstract
In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
| Original language | English |
|---|---|
| Title of host publication | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 162-163 |
| Number of pages | 2 |
| ISBN (Electronic) | 4891140402, 9784891140403 |
| DOIs | |
| Publication status | Published - Jan 1 2003 |
| Event | International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: Oct 29 2003 → Oct 31 2003 |
Publication series
| Name | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 |
|---|
Other
| Other | International Microprocesses and Nanotechnology Conference, MNC 2003 |
|---|---|
| Country | Japan |
| City | Tokyo |
| Period | 10/29/03 → 10/31/03 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering
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Cite this
Yamazaki, K., & Namatsu, H. (2003). 5-nm-order electron-beam lithography for nanodevice fabrication. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 162-163). [1268626] (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268626