5-nm-order electron-beam lithography for nanodevice fabrication

K. Yamazaki, H. Namatsu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages162-163
Number of pages2
ISBN (Print)4891140402, 9784891140403
DOIs
Publication statusPublished - 2003
Externally publishedYes
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: Oct 29 2003Oct 31 2003

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2003
CountryJapan
CityTokyo
Period10/29/0310/31/03

Fingerprint

Electron beam lithography
Fabrication
Scanning electron microscopy

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Yamazaki, K., & Namatsu, H. (2003). 5-nm-order electron-beam lithography for nanodevice fabrication. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 162-163). [1268626] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268626

5-nm-order electron-beam lithography for nanodevice fabrication. / Yamazaki, K.; Namatsu, H.

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 162-163 1268626.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yamazaki, K & Namatsu, H 2003, 5-nm-order electron-beam lithography for nanodevice fabrication. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268626, Institute of Electrical and Electronics Engineers Inc., pp. 162-163, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 10/29/03. https://doi.org/10.1109/IMNC.2003.1268626
Yamazaki K, Namatsu H. 5-nm-order electron-beam lithography for nanodevice fabrication. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 162-163. 1268626 https://doi.org/10.1109/IMNC.2003.1268626
Yamazaki, K. ; Namatsu, H. / 5-nm-order electron-beam lithography for nanodevice fabrication. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 162-163
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